NARROW TRACK WIDTH SINGLE-POLE HEAD WITH Fe-Si-Al-N THIN FILM

Amorphous Ta-Si-N thin-film alloys as diffusion barrier in AI/Si metallizations

Amorphous Ta-Si-N thin films of a wide range of compositions were prepared by r~ ~eactive sputtering of a Ta5Si3 target in a N2/ Ar plasma. The relatio~shi~ betwee~ films' compos1t10n an~ resistivity is reported. All obtained films were tested as dtffuston barners between ~1 and S1. Backscattering spectrometry combined with cross-sectional transmis_sion electron m1eroscopy were used to determin...

Deconvoluted Si 2p Photoelectron Spectra of Ultra thin SiO2 film with FitXPS method

The main impetus for our research is provided by the growing interest worldwide in ultra thin silicon dioxide on silicon based nano devices. The obvious need for better knowledge in the ultra thin gate silicon dioxides, is motivated both by interests in fundamental research and phenomenology as well as by interests in possible applications, which can be found with better fitting of experimental...

بررسی خواص سایشی آلیاژهای Al-(5-13)Si-Fe

در این تحقیق تاثیر آهن (wt%2-2/0) بر خواص سایشی آلیاژهای Al-(5-13)Si مورد بررسی قرار گرفته است. آزمایش‌های سایش در دمای محیط، بار N45، سرعت m/s13/0 و مسافت m1000 به روش پین روی دیسک انجام شدند. بر اساس نتایج به دست آمده، در غلظت‌های آهن کمتر از غلظت بحرانی (wt%2/1 در این تحقیق)، افزایش سیلیسیم موجب شکل‌گیری صفحات ظربف AlFeSi در نواحی بین دندریتی شده و بواسطه افزایش سختی زمینه و کاهش سیلان پلاست...

Short-Channel Poly-Si Thin-Film Transistors with Ultrathin Channel

Soft Magnetic Properties of High-Entropy Fe-Co-Ni-Cr-Al-Si Thin Films

Soft magnetic properties of Fe-Co-Ni-Al-Cr-Si thin films were studied. As-deposited Fe-Co-Ni-Al-Cr-Si nano-grained thin films showing no magnetic anisotropy were subjected to field-annealing at different temperatures to induce magnetic anisotropy. Optimized magnetic and electrical properties of Fe-Co-Ni-Al-Cr-Si films annealed at 200 ◦C are saturation magnetization 9.13 × 105 A/m, coercivity 79...